TEM characterization of ALD layers in deep trenches utilizing a committed FIB lamellae planning process N2 conductance measurements (assuming molecular flow within the pores). The pore measurement was lesser after a metal reactant publicity than following the following H2O publicity, in accordance with the replacement in the bulkier metal reactant https://ald-applications26936.therainblog.com/21723678/helping-the-others-realize-the-advantages-of-atomic-layer-deposition