Atomic layer deposition (ALD) is a gasoline stage slender movie deposition method that has been uncovered and produced independently inside the 1960s from the Soviet Union and in 1974 in Finland.one–3 This system is characterised by exposing the substrate to an alternating sequence of vapor phase reactants. We also use https://ald-film-properties59482.educationalimpactblog.com/41579717/5-simple-statements-about-atomic-layer-deposition-explained